Patterning of NiFe and NiFeCo in CO/NH3 high density plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 2, 1999, Pages 535-539

  Jung, K B ^a   Hong, J ^a   Cho, H ^a   Onishi, S ^b   Johnson, D ^b   Park, Y D ^a   Childress, J R ^c   Pearton, S J ^a  

^a University of Florida   (United States)

^b Qualtx Technology Inc   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033413081     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581615     Document Type: Article

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