Oxide-free InSb (100) surfaces by molecular hydrogen cleaning

Applied Physics Letters

Volumn 88, Issue 3, 2006, Pages 1-3

  Tessler, R ^a   Saguy, C ^a   Klin, O ^b   Greenberg, S ^b   Weiss, E ^b   Akhvlediani, R ^a   Edrei, R ^a   Hoffman, A ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b SCD SemiConductor Devices   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DESORPTION; HYDROGEN; INDIUM COMPOUNDS; MOLECULAR BEAM EPITAXY; MORPHOLOGY; SURFACE CLEANING;

HYDROGEN FLOW; MOLECULAR HYDROGEN CLEANING (MHC); NANOMETRIC SCALE; SURFACE OXIDES;

SINGLE CRYSTALS;

EID: 31144466034     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2162702     Document Type: Article

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