Atomic hydrogen cleaning, nitriding and annealing InSb (100)

Applied Surface Science

Volumn 166, Issue 1, 2000, Pages 253-258

  Haworth, L ^a   Lu, J ^a   Westwood, D I ^a   MacDonald, J E ^a  

^a CARDIFF UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CONTAMINATION; HYDROGEN; NITRIDING; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING INDIUM COMPOUNDS; SURFACE CLEANING; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN CLEANING; STEP-TERRACE STRUCTURES;

SEMICONDUCTING FILMS;

EID: 0034301332     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00425-6     Document Type: Article

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