Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 5, 2005, Pages 2218-2221

  Kuroiwa, Shunji ^a   Mine, Teruyuki ^b   Yagisawa, Takashi ^b   Makabe, Toshiaki ^b  

^a Shibaura Mechatronics Corporation   (Japan)

^b KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; IONS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; SILICA;

DIELECTRIC EROSION; DISCHARGE SPACE; SHEATH PROFILE;

DIELECTRIC MATERIALS;

EID: 31144441303     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2009771     Document Type: Conference Paper

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