Characterization of a plasma produced by pulsed arc using an electrostatic double probe

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 3, 2005, Pages 551-553

  Garcia L A ^a   Pulzara, A O ^a   Devia, A ^a   Restrepo, E ^a  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; COMPUTER SIMULATION; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRODES; ELECTROSTATICS;

ELECTRON TEMPERATURE; PLASMA PARAMETERS; REACTION CHAMBER;

PLASMA SOURCES;

EID: 31044440653     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1901666     Document Type: Article

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