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Thin Solid Films

Volumn 498, Issue 1-2, 2006, Pages 70-74

Integration issues for siloxane-based hydrogen silsesquioxane (HSQ) applied on TFT-LCDs

(5) Chang, Ta Shan a Chang, Ting Chang b,d Liu, Po Tsun c,e Chang, Tien Shan a Yeh, Feng Sheng a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

c NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

d NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

e NATIONAL NANO DEVICE LABORATORIES (Taiwan)

Author keywords

Low k; Passivation; TFT

Indexed keywords

HYDROGEN SILSESQUIOXANE (HSQ); LOW-K; RC TIME DELAY; TFT;

DIELECTRIC MATERIALS; HYDROGEN; LIQUID CRYSTAL DISPLAYS; PASSIVATION; SILICON COMPOUNDS;

THIN FILM TRANSISTORS;

EID: 30944461381 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.07.068 Document Type: Conference Paper

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.