Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects

Applied Optics

Volumn 45, Issue 1, 2006, Pages 15-21

  Wu, Shun Der ^a   Gaylord, Thomas K ^a   Maikisch, Jonathan S ^a   Glytsis, Elias N ^b  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ANNEALING; ETCHING; LIGHT POLARIZATION; OPTICAL INTERCONNECTS; OPTIMIZATION; SILICON;

INCIDENT ANGLES; RANDOM LINEAR (RL) POLARIZATIONS; SILICON SURFACE-RELIEF GRATINGS; SLANT ANGLES;

DIFFRACTION GRATINGS;

EID: 30844470024     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.000015     Document Type: Article

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