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Defect and Diffusion Forum

Volumn 237-240, Issue PART 1, 2005, Pages 334-339

Diffusion of Si in Ti3Al intermetallic compound

(4) Koizumi, Yuichiro a Sakakibara, Yohei a Minamino, Yoritoshi a Tsuji, Nobuhiro a

a OSAKA UNIVERSITY (Japan)

Author keywords

Activation Energy; Anti site Atom; D019 structure; Ordered Alloy; Silicon; Vacancy

Indexed keywords

ACTIVATION ENERGY; COMPOSITION; CONCENTRATION (PROCESS); INTERMETALLICS; SILICON; TITANIUM COMPOUNDS;

ANTI-SITE ATOM; ORDERED ALLOY; VACANCY;

DIFFUSION;

EID: 30744475735 PISSN: 10120386 EISSN: 16629507 Source Type: Journal
DOI: 10.4028/www.scientific.net/ddf.237-240.334 Document Type: Conference Paper

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.