An intensity correction for pole figure measurements by grazing incident and grazing exit angle X-ray diffraction

Materials Characterization

Volumn 52, Issue 2, 2004, Pages 135-143

  Njeh, Anouar ^a   Wieder, Thomas ^b   Ghozlen, Mohamed Hédi Ben ^a   Fuess, Hartmut ^b  

^a University of Sfax   (Tunisia)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Grazing exit; Grazing incidence; Texture measurement; Thin films; X ray diffraction

Indexed keywords

COPPER; DIFFRACTOMETERS; GEOMETRY; IRRADIATION; METALLIC FILMS; RESIDUAL STRESSES; STRAIN; TEXTURES; X RAY DIFFRACTION ANALYSIS;

GRAZING EXIT; GRAZING INCIDENCE; STRESS EVALUATION; TEXTURE MEASUREMENT;

THIN FILMS;

EID: 3042838752     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2004.02.008     Document Type: Article

References (11)

1. Szpunar J.A., Ahlroos S., Tavernier P.H. Method of measurement and analysis of texture in thin films. J. Mater. Sci. 28:1993;2366-2376.
2. Tizliouine A., Bessières J., Heizmann J.J., Bobo J.F. Thin film study using low-incidence and Bragg-Brentano texture goniometry. Application to mono- and bilayers of Al and Al/Fe. J. Appl. Crystallogr. 29:1996;531-539.
3. Njeh A., Wieder T., Fuess H. Grazing excidence diffraction versus grazing incidence diffraction for strain/stress evaluation in thin films. Powder Diffr. 15:2000;211-215.
4. Heizmann J.J., Vadon A., Schlatter D., Bessières J. Texture analysis of thin films and surface layers by low angle X-ray diffraction. Adv. X-Ray Anal. 32:1989;285-292.
5. Wenk H.-R. Measurement of pole figures. Wenk H.-R. Preferred orientation in deformed metals and rocks: an introduction to modern texture analysis. 1985;11-48 Academic Press, Orlando.
6. Vaudin M.D., Rupich M.W., Jowett M., Riley G.N., Bingert J.F. A method for crystallography texture investigations using standard X-ray equipment. J. Mater. Res. 13:1998;2910-2919.
7. Snyder R.L., Fiala J., Bunge H.J. Defect and microstructure analysis by diffraction. Bunge H.J. Texture and structure of polycrystals. 1999;405-513 Oxford Univ. Press, New York.
8. Wenk H.R., Sintubin M., Huang J., Johnson G.C., Howe R.T. Texture analysis of polycrystalline silicon films. J. Appl. Phys. 67:1990;572-574.
9. Heizmann J.J., Schlatter D., Vadon A., Baltzinger C., Bessières J. Low incidence X-ray goniometer for thin films texture analysis. Textures Microstruct. 14-18:1991;181-186.
10. Schulz L.G. A direct method of determining preferred orientation of a flat reflection sample using a Geiger counter X-ray spectrometer. J. Appl. Phys. 20:1949;1030-1033.
11. Noyan I.C., Cohen J.B. Residual stress. 1987;Springer Verlag, Berlin.