Infrared multiphoton dissociation of SiF4: Gas phase reactions of SiF3 with F and H2

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 165, Issue 1-3, 2004, Pages 209-214

  Alcaraz, A N ^a   Codnia, J ^b   Azcarate M L ^b  

^a UNIVERSIDAD DE BUENOS AIRES   (Argentina)

^b Instituto de Investigaciones Cientificas y Tecnicas de Las Fuerzas Armadas   (Argentina)

Author keywords

Infrared multiphoton dissociation; Reaction rate; Silicon tetrafluoride; Trifluorosilyl

Indexed keywords

FLUORIDE; FLUORINE; HYDROGEN; SILICON DERIVATIVE; TRIETHYLAMINE;

ARTICLE; CARBON DIOXIDE LASER; CHEMICAL REACTION; CHEMICAL REACTION KINETICS; CONTROLLED STUDY; DISSOCIATION; GAS; INFRARED RADIATION; PHOTON;

EID: 3042836181     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2004.03.019     Document Type: Article

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