Si isotope separation for low activation

Journal of Nuclear Materials

Volumn 233-237, Issue PART II, 1996, Pages 1496-1499

  Noda, T ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE LASERS; CONCENTRATION (PROCESS); DECOMPOSITION; LASER PULSES; NEUTRON ACTIVATION ANALYSIS; NEUTRON IRRADIATION; RADIOISOTOPES; SILANES; SILICON; SILICON CARBIDE;

HEXAFLUORODISILANE; SILICONE ISOTOPE SEPARATION;

FUSION REACTORS;

EID: 0030262535     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(96)00328-5     Document Type: Article

References (2)

1. H. Suzuki, H. Araki and T. Noda, J. Jpn. Inst. Met. 58 (1994).
2. M. Kamioka, Y. Ishikawa, H. Kaetsu, S. Isomura and S. Arai, J. Phys. Chem. 90 (1986) 5727.