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Applied Physics Letters

Volumn 84, Issue 22, 2004, Pages 4481-4483

Carbon nanotube-enhanced performance of microplasma devices

(3) Park, S J a Eden, J G a Park, K H b

a University of Illinois at Urbana Champaign (United States)

b UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EMISSIONS; IGNITION VOLTAGES; RADIATIVE EFFICIENCIES; SPATIAL DISTRIBUTION;

CARBON NANOTUBES; CATALYSTS; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; ELECTRIC FIELDS; ELECTRONIC EQUIPMENT; FILM GROWTH; FLAT PANEL DISPLAYS; METHANE; NANOSTRUCTURED MATERIALS; NICKEL; OPTIMIZATION;

PLASMA DEVICES;

EID: 3042704465 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1755845 Document Type: Article

Times cited : (41)

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