Growth of polycrystalline LaNi 1-xCo xO 3 (x = 0.3, 0.5) thin films on Si(100) by pulsed laser deposition

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 3, 2004, Pages 671-675

  Androulakis, J ^a,b   Klini, A ^a   Manousaki, A ^a   Violakis, G ^a,c   Giapintzakis, J ^a,b  

^a INSTITUTE OF COMPUTER SCIENCE   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

^c NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

LASER FLUENCE; METAL-ORGANIC DECOMPOSITION; TEMPERATURE-INDEPENDENT RESISTIVITY; TRANSITION-METAL OXIDES;

COBALT COMPOUNDS; DEPOSITION; ELECTRODES; EXCIMER LASERS; LANTHANUM COMPOUNDS; MAGNETIZATION; NICKEL COMPOUNDS; POLISHING; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; SATURATION (MATERIALS COMPOSITION); SILICON COMPOUNDS; SUBSTRATES; TEXTURING; THIN FILMS;

GROWTH (MATERIALS);

EID: 3042687236     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2177-6     Document Type: Article

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