Titration of N and C atoms in flowing N2-CH4 post- discharge between 300 K and 850 K

EPJ Applied Physics

Volumn 26, Issue 3, 2004, Pages 227-234

  Jaoul, C ^a,b   Czerwiec, T ^b   Belmonte, T ^b   Ricard, A ^b   Michel, H ^b  

^a HEF R and D   (France)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CARBONITRIDING; DENSITY (OPTICAL); ELECTRIC DISCHARGES; MATHEMATICAL MODELS; MICROWAVES; PLASMA APPLICATIONS; SPECTROMETERS; TITRATION;

ATOM DENSITY; FLOWING POST-DISCHARGE; OPTICAL (ULTRAVIOLET, VISIBLE, INFRARED) MEASUREMENTS; PLASMA REACTIONS;

NITROGEN;

EID: 3042624133     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2004039     Document Type: Conference Paper

References (31)

1. T. Belmonte, T. Czerwiec, H. Michel, Nitruration et traitements en post-décharge, Traitements des surfaces en phase vapeur (Lavoisier, 2002)
2. T. Bell, Y. Sun, A. Suhadi, Vacuum 59, 14 (2000)
3. C.D. Pintassilgo, J. Loureiro, G. Cernogora, M. Touzeau, Plasma Sources Sci. Technol. 8, 463 (1999)
4. C.D. Pintassilgo, G. Cernogora, J. Loureiro, Plasma Sources Sci. Technol. 10, 147 (2001)
5. J.-C. Legrand, A.-M. Diamy, R. Hrach, V. Hrachova, Contrib. Plasma Phys. 37, 521 (1997)
6. J.-C. Legrand, A.-M. Diamy, R. Hrach, V. Hrachova, Vacuum 48, 671 (1997)
7. J.-C. Legrand, A.-M. Diamy, R. Hrach, V. Hrachova, Vacuum 50, 491 (1998)
8. J.-C. Legrand, A.-M. Diamy, R. Hrach, V. Hrachova, Vacuum 52, 27 (1999)
9. A. Ricard, J. High Temp. Chem. Proc., Colloque (Suppl. No. 3) 1 (1992)
10. A. Ricard, H. Malvos, S. Bordeleau, J. Hubert, J. Phys. D: Appl. Phys. 27, 504 (1994)
11. A.-M. Diamy, L. Hochard, J.-C. Legrand, A. Ricard, Surf. Coat. Technol. 98, 1377 (1998)
12. I.A. Kossyi, A.Y. Kostinsky, A.A. Matveyev, V.P. Silakov, Plasma Sources Sci. Technol. 1, 207 (1992)
13. F.R. Gilmore, R.R. Laher, P.J. Espy, J. Phys. Chem. Ref. Data 21, 1005 (1992)
14. L.G. Piper, J. Chem. Phys. 88, 6911 (1988)
15. A. Ricard, T. Czerwiec, T. Belmonte, S. Bockel, H. Michel, Thin Solid Films 341, 1 (1999)
16. A. Ricard, A.R. de Souza, J. Phys. III France 4, 2593 (1994)
17. P. Pezé-Bourdarie, A.R. de Souza, A. Ricard, Le vide 54, 456 (1999)
18. J.L. Jauberteau, I. Jauberteau, M.J. Cinelli, J. Aubreton, New J. Phys. 4, 39.1 (2002)
19. M.W. Slack, E.S. Fishburne, J. Chem. Phys. 52, 5830 (1970)
20. D. Kley, N. Washida, K.H. Becker, W. Groth, Chem. Phys. Lett. 15, 45 (1972)
21. N. Washida, D. Kley, K.H. Becker, W. Groth, J. Chem. Phys. 63, 4230 (1975)
22. P.J. Knowles, H.J. Werner, P.J. Hay, D.C. Cartwright, J. Chem. Phys. 89, 7334 (1988)
23. E.N. Tereshchenko, N.Y. Dodonova, Opt. Spectrosc. 39, 435 (1975)
24. H. Lavendy, G. Gandara, J.B. Robbe, J. Mol. Spectrosc. 106, 395 (1984)
25. A. Ricard, C. Nouvellon, S. Konstantinidis, J.P. Dauchot, M. Wautelet, M. Hecq, J. Vac. Sci. Technol. A 20, 1488 (2002)
26. T. Czerwiec, J. Gavillet, T. Belmonte, H. Michel, A. Ricard, Surf. Coat. Technol. 98, 1411 (1998)
27. H. Malvos, H. Michel, A. Ricard, J. Phys. D: Appl. Phys. 27, 1328 (1994)
28. H. Partridge, S.R. Langhoff, C.W. Bauschlicher Jr., D.W. Schwenke, J. Chem. Phys. 88, 3174 (1988)
29. G. Callede, J. Deschamps, J.L. Godart, A. Ricard, J. Phys. D: Appl. Phys. 24, 909 (1991)
30. A. Ricard, J. Deschamps, J.L. Godard, L. Falk, H. Michel, J. Mater. Sci. Eng. A 139, 9 (1991)
31. A. Ricard, J. Trétreault, J. Hubert, J. Phys. B: At. Mol. Opt. Phys. 24, 1115 (1991)