Measurement of carbon atom density in the flowing afterglow of a CH4-N2 microwave plasma

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1377-1381

  Diamy, A M ^a   Hochard, L ^b   Legrand, J C ^a   Ricard, A ^b  

^a CNRS   (France)

^b UNIVERSITÉ PARIS SUD   (France)

Author keywords

Carbon atom titration; Methane; Microwave plasma; Nitrogen

Indexed keywords

EID: 0004792156     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00266-1     Document Type: Article

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