Electrochemical deposition of ZnO1-xSx thin films using three-step pulse

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 42-45, 2005, Pages

  Fathy, Naglaa ^a   Ichimura, Masaya ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Bandgap bowing; Electrochemical deposition; Thin film; Three step pulse; ZnO1 xSx

Indexed keywords

ACIDITY; BENDING (FORMING); COLLOIDS; ELECTROCHEMISTRY; ELECTRODEPOSITION; ENERGY GAP; SOLUTIONS; SULFUR; ZINC OXIDE;

BANDGAP BOWING; THREE-STEP PULSE; ZNO1-XSX;

THIN FILMS;

EID: 30344479162     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.L1295     Document Type: Article

References (11)

1. T. Makino, Y. Sagawa, M. Kawasaki, A. Ohtomo, R. Shiroki, K. Tamura, T. Yasuda and H. Koinuma: Appl. Phys. Lett. 78 (2001) 1237.
2. N. B. Chen, H. Z. Wu and T. N. Xu: J. Appl. Phys. 97 (2005) 023515.
3. T. Yildrim, E. Gur, S. Tuzemen, V. Bilgin, S. Kose, F. Atay and I. Akyuz: Physica E 27 (2005) 290.
4. C.-Y. Ren, S. H. Chiou and C.-S. Hsue: Physica B 349 (2004) 136.
5. K. Iwata, P. Fons, A. Yamada, H. Shibata, K. Matsubara, K. Nakahara, H. Takasu and S. Niki: Phys. Status Solidi B 229 (2002) 887.
6. W. Shan, W. Walukkiewicz, J. W. Ager III, K. M. Yu, J. Wu, E. E. Haller, Y. Nabitani, T. Mukawa, Y. Ito and T. Matsumoto: Appl. Phys. Lett. 83 (2004) 299.
7. B. K. Mayer, A. Polity, B. Farangis, Y. He, D. Hasselkamp, Th. Kramer and C. Wang: Appl. Phys. Lett. 85 (2004) 4929.
8. Y. Z. Yoo, Z.-W. Jin, T. Chikyow, T. Fukumura, M. Kawasaki and H. Koinuma: Appl. Phys. Lett. 81 (2005) 3798.
9. Naglaa Fathy, R. Kobayashi and M. Ichimura: Mater. Sci. Eng. B 107 (2004) 271.
10. Naglaa Fathy and M. Ichimura: submitted to Mater. Sci. Eng. B.
11. J. A. Van Vechten and T. K. Bergstresser: Phys. Rev. B 1 (1970) 3351.