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Volumn 497, Issue 1-2, 2006, Pages 130-134

Dependences of the Al thickness and annealing temperature on the structural, optical and electrical properties in ZnO/Al multilayers

Author keywords

Multilayers; Resistivity; Sputtering; Zinc oxide

Indexed keywords

ALUMINUM; ANNEALING; ELECTRIC CONDUCTIVITY; SPUTTERING; TEMPERATURE DISTRIBUTION; THICKNESS MEASUREMENT; ZINC OXIDE;

EID: 30344475820     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.10.058     Document Type: Article
Times cited : (31)

References (18)
  • 12
    • 0003494870 scopus 로고
    • J.L. Vossen W. Kern Academic Press New York
    • J.M.E. Harper J.L. Vossen W. Kern Thin Film Processes 1978 Academic Press New York 175 Ch. II-5
    • (1978) Thin Film Processes , pp. 175
    • Harper, J.M.E.1
  • 13
    • 0003746634 scopus 로고
    • J.J. Cuomo S.M. Rossnagel H.R. Kaufman Noyes Publications Park Ridge, NJ
    • J.E.E. Baglin J.J. Cuomo S.M. Rossnagel H.R. Kaufman Handbook of Ion Beam Processing Technology 1989 Noyes Publications Park Ridge, NJ Ch. 14
    • (1989) Handbook of Ion Beam Processing Technology
    • Baglin, J.E.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.