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Volumn 497, Issue 1-2, 2006, Pages 130-134
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Dependences of the Al thickness and annealing temperature on the structural, optical and electrical properties in ZnO/Al multilayers
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Author keywords
Multilayers; Resistivity; Sputtering; Zinc oxide
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Indexed keywords
ALUMINUM;
ANNEALING;
ELECTRIC CONDUCTIVITY;
SPUTTERING;
TEMPERATURE DISTRIBUTION;
THICKNESS MEASUREMENT;
ZINC OXIDE;
ANNEALING TEMPERATURE;
ATOMIC LAYER;
ION-BEAM SPUTTERING;
LOW RESISTIVITY;
MULTILAYERS;
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EID: 30344475820
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2005.10.058 Document Type: Article |
Times cited : (31)
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References (18)
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