Erratum to: "Excitation Localization and Stokes' shift in Zn1-xCdxO thin films depending on chemical composition" [J. Crystal Growth 287(2006)70] (DOI:10.1016/j.jcrysgro.2005.10.045);Exciton localization and stokes' shift in Zn1- xCdxO thin films depending on chemical composition

Journal of Crystal Growth

Volumn 287, Issue 1, 2006, Pages 70-73

  Kang, Hong Seong ^a   Lim, Sung Hoon ^a   Kim, Jae Won ^a   Chang, Hyun Woo ^a   Kim, Gun Hee ^a   Kim, Jong Hoon ^a   Lee, Sang Yeol ^a   Li, Y ^b   Lee, Jang Sik ^b   Lee, J K ^b   Nastasi, M A ^b   Crooker, S A ^b   Jia, Q X ^b  

^a Yonsei University   (South Korea)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

A1. Characterization; A3. Physical vapor deposition processes; B2. Semiconducting ternary compounds

Indexed keywords

CHARACTERIZATION; EXCITONS; OPTICAL PROPERTIES; PHASE COMPOSITION; PHOTOLUMINESCENCE; THIN FILMS; ZINC;

ABSORPTION EDGE; OPTICAL ENERGY BAND GAP; PHYSICAL VAPOR DEPOSITION PROCESSES; SEMICONDUCTING TERNARY COMPOUNDS;

PULSED LASER DEPOSITION;

EID: 29844441093     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.01.020     Document Type: Erratum

References (16)

1. D.C. Look, G.M. Renlund, R.H. Burgener II, and J.R. Sizelove Appl. Phys. Lett. 85 2004 5269
2. D.C. Look Mater. Sci. Eng. B 80 2001 383
3. S.Y. Lee, Y. Li, J.-S. Lee, J.K. Lee, M. Nastasi, S.A. Crooker, Q.X. Jia, H.S. Kang, and J.S. Kang Appl. Phys. Lett. 85 2004 218
4. H. Ohta, K. Kawamura, M. Orita, M. Hirano, N. Sarukura, and H. Hosono Appl. Phys. Lett. 77 2000 475
5. S.A. Studenikin, N. Golego, and M. Cocivera J. Appl. Phys. 84 1998 2287
6. H.S. Kang, J.S. Kang, J.W. Kim, and S.Y. Lee J. Appl. Phys. 95 2004 1246
7. D.C. Reynolds, D.C. Look, and B. Jogai Solid State Commun. 99 1996 873
8. D.M. Bagnall, Y.F. Chen, Z. Zhu, T. Yao, S. Koyama, M.Y. Shen, and T. Goto Appl. Phys. Lett. 70 1997 2230
9. M. Fukuda Optical Semiconductor Devices 1998 Wiley New York pp. 93-210
10. T. Makino, Y. Segawa, M. Kawasaki, A. Ohtomo, R. Shiroki, K. Tamura, T. Yasuda, and H. Koinuma Appl. Phys. Lett. 78 2001 1237
11. B. Lin, Z. Fu, and Y. Jia Appl. Phys. Lett. 79 2001 943
12. C. Sravani, K.T.R. Reddy, and P.J. Reddy Mater. Lett. 15 1993 356
13. K.P. O'Donnell, R.W. Martin, and P.G. Middleton Phys. Rev. Lett. 82 1999 237
14. R.W. Martin, P.G. Middleton, K.P. O'Donnell, and W. Van der Stricht Appl. Phys. Lett. 74 1999 263
15. C.F. Klingshirn Semiconductor Optics 1995 Springer Berlin, Heidelberg pp. 171-173, 248-253
16. Th. Gruber, C. Kirchner, R. Kling, F. Reuss, A. Waag, F. Bertram, D. Forster, J. Christen, and M. Schreck Appl. Phys. Lett. 83 2003 3290