Early results show much promise for immersion

Solid State Technology

Volumn 47, Issue 5, 2004, Pages 43-48

  Owa, Soichi ^a   Nagasaka, Hiroyuki ^a   Ishii, Yuuki ^a   Hirakawa, Osamu ^b   Yamamoto, Taro ^b  

^a NIKON CORPORATION   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; HYDRODYNAMICS; INTEGRATED CIRCUITS; LENSES; LIGHT POLARIZATION; LIGHT REFLECTION; NOZZLES; PRODUCTION ENGINEERING; REFRACTIVE INDEX; SEMICONDUCTOR DEVICE MANUFACTURE;

DEPTH OF FOCUS (DOF); IMMERSION LITHOGRAPHY TECHNOLOGY; NIKON CORP (CO); TOKYO ELECTRON LTD (CO);

LITHOGRAPHY;

EID: 2942752061     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)

1. M. Switkes, M. Rothschild, J. Vac. Sci. Technol. B 19, 2353, 2001.
2. B.J. Lin, Proc SPIE 4688, 11, 2002.
3. S. Owa, H. Nagasaka, Proc SPIE 5040, 724, 2003.
4. S. Owa, H. Nagasaka, J. Microlithography, Microfabrication and Microsystems 3 (1), 97, 2004.