Electron transport through metal-multiwall carbon nanotube interfaces

IEEE Transactions on Nanotechnology

Volumn 3, Issue 2, 2004, Pages 311-317

  Ngo, Quoc ^a   Petranovic, Dusan ^a   Krishnan, Shoba ^a   Cassell, Alan M ^b   Ye, Qi ^b   Li, Jun ^b   Meyyappan, M ^b   Yang, Cary Y ^a  

^a Santa Clara University   (United States)

^b NASA AMES RESEARCH CENTER   (United States)

Author keywords

Carbon nanotube (CNT); Contact resistance; On chip interconnect

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC RESISTANCE; ELECTRICITY; ELECTRODES; ELECTRON TRANSITIONS; HETEROJUNCTIONS; INTERCONNECTION NETWORKS; MICROPROCESSOR CHIPS; OPTIMIZATION; SYNTHESIS (CHEMICAL);

CONTACT RESISTANCE; ELECTRON BOMBARDMENTS; ON-CHIP INTERCONNECTS;

CARBON NANOTUBES;

EID: 2942739172     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2004.828553     Document Type: Article

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