Photochemical process of divalent germanium responsible for photorefractive index change in GeO2SiO2 glasses

Optics Express

Volumn 11, Issue 21, 2003, Pages 2679-2688

  Sakoh, Akifumi ^a   Takahashi, Masahide ^a,b   Yoko, Toshinobu ^a   Nishii, Junji ^c   Nishiyama, Hiroaki ^d   Miyamoto, Isamu ^d  

^a KYOTO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^d OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FIBER BRAGG GRATINGS; GERMANIUM COMPOUNDS; GLASS; PHOTOLUMINESCENCE; PHOTOSENSITIVITY; REFRACTIVE INDEX;

EMISSION INTENSITY; PHOTOREFRACTIVE INDEX; STOKES SHIFT;

PHOTOREFRACTIVE MATERIALS;

EID: 2942737027     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OE.11.002679     Document Type: Article

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