Photosensitive GeO2–SiO2films for ultraviolet laser writing of channel waveguides and Bragg gratings with Cr–loaded waveguide structure

Applied Optics

Volumn 42, Issue 22, 2003, Pages 4594-4598

  Takahashi, Masahide ^a   Sakoh, Akifumi ^a   Ichii, Kentaro ^a   Tokuda, Yomei ^a   Yoko, Toshinobu ^a   Nishii, Junji ^b  

^a KYOTO UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG CELLS; LASER BEAM EFFECTS; PHOTOREFRACTIVE MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; ULTRAVIOLET RADIATION;

ULTRAVIOLET LASER WRITING;

WAVEGUIDES;

EID: 0042882835     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.004594     Document Type: Article

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