Fabrication of an improved gray-scale mask for refractive micro- and meso-optics

Optics Letters

Volumn 29, Issue 5, 2004, Pages 457-458

  Zhou, Zhou ^a   Lee, Sing H ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRAY SCALE MASKS; HIGH ENERGY BEAM SENSITIVE (HEBS) GLASSES; LIGHT ATTENUATING FILMS (LAF);

ATTENUATION; ELECTRON BEAM LITHOGRAPHY; ETCHING; ION BEAM LITHOGRAPHY; MASKS; REFRACTIVE INDEX; ULTRAVIOLET RADIATION;

MICROOPTICS;

EID: 2942729768     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.29.000457     Document Type: Article

References (10)

1. G. J. Swanson and W. B. Veldkamp, "High-efficiency, multi-level diffractive optical elements," U.S. patent 4,895,790 (January 23, 1990).
2. G. J. Swanson, "Binary optics technology: theoretical limits on the diffraction efficiency of multi-level diffractive optical elements," Tech. Rep. 914 (MIT, Cambridge, Mass., 1991).
3. W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, Appl. Opt. 36, 4675 (1997).
4. W. Daschner, P. Long, R. Stein, C. Wu, and S. H. Lee, J. Vac. Sci. Technol. B 14, 3730 (1996).
5. C. Wu, "Method of making high energy beam sensitive glass," U.S. patent 5,078,771 (January 7, 1992).
6. "Properties of HEBS-Glass," (Canyon Materials, Inc., San Diego, Calif.), retrieved March 10, 2003, http:// www.canyonmaterials.com/prop_hebs1. html.
7. M. R. Wang and H. Su, Opt. Lett. 23, 876 (1998).
8. E. B. Kley, M. Cumme, L. C. Wittig, and C. Wu, Proc. SPIE 3633, 35 (1999).
9. C. Gimkiewicz, D. Hagedorn, J. Jahns, E. B. Kley, and F. Thoma, Appl. Opt. 38, 2986 (1999).
10. S. H. Lee, M. S. Jin, and M. L. Scott, "Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics," U.S. patent 6,534,221 (March 18, 2003).