Extending a GTD-based image formation technique to EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 682-689

  Khoh, Andrew ^a,d   Flagello, Donis ^b   Milster, Tom ^c   Choi, Byoung Il ^a   Samudra, Ganesh S ^d   Wu, Yihong ^d  

^a CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

^b ASML US Inc   (United States)

^c UNIVERSITY OF ARIZONA   (United States)

^d NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

DER; EUV lithography; GTD; Image formation technique; OPC

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; IMAGING SYSTEMS; LIGHT POLARIZATION; LIGHT REFLECTION; MASKS; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; GEOMETRICAL THEORY OF DIFFRACTION; IMAGE FORMATION TECHNIQUE; PHASE MASK IMAGING;

PHOTOLITHOGRAPHY;

EID: 0141724699     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485501     Document Type: Conference Paper

References (10)

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