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Volumn 798, Issue , 2003, Pages 107-112

LP-MOCVD growth of GaAlN/GaN heterostructures on silicon carbide. Application to HEMT's devices

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CORRELATION METHODS; GALLIUM NITRIDE; HIGH ELECTRON MOBILITY TRANSISTORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; X RAY DIFFRACTION;

EID: 2942691980     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-798-y10.26     Document Type: Conference Paper
Times cited : (5)

References (4)
  • 2
    • 2942697353 scopus 로고    scopus 로고
    • Silicon carbide crystal and substrate technology: A survey of recent advances
    • Lyon
    • H. MCD. Hobgood, "Silicon Carbide Crystal and Substrate Technology: A Survey of Recent Advances", (ICSCRM2003, Proc, Lyon, 2003) pp.46.
    • (2003) ICSCRM2003, Proc , pp. 46
    • Hobgood, H.Mcd.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.