Binding state and microstructure analyses of Co-doped TiO 2 thin film

Journal of Applied Physics

Volumn 95, Issue 11 II, 2004, Pages 7375-7377

  Yao, X F ^a,b   Zhou, T J ^a   Gai, Y X ^a   Chong, T C ^a,b   Wang, J P ^a,c  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING STATES; LATTICE MISMATCH; POSTANNEALING TREATMENT; SELECTED AREA DIFFRACTION (SAD);

ANNEALING; BINDING ENERGY; COBALT; DIFFUSION; FERROMAGNETIC MATERIALS; MAGNETIC SEMICONDUCTORS; MAGNETIZATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; MULTILAYERS; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 2942672477     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1689432     Document Type: Conference Paper

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