Formation of epitaxial β-FeSi2 nanodots array on strained Si/Si0.8Ge0.2 (001) substrate

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 44-47

  Chen, H C ^a   Liao, K F ^a   Lee, S W ^a   Cheng, S L ^a   Chen, L J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

FeSi2; Nanodot; Strained Si

Indexed keywords

EPITAXIAL GROWTH; IRON COMPOUNDS; LATTICE CONSTANTS; NANOSTRUCTURED MATERIALS; SILICON; SINGLE CRYSTALS; STRAIN; SURFACE CHEMISTRY;

Β-FESI2; NANODOTS; STRAINED SI;

THIN FILMS;

EID: 2942653021     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.058     Document Type: Conference Paper

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