Ablation of Si and Ge using UV femtosecond laser pulses

Materials Research Society Symposium - Proceedings

Volumn 397, Issue , 1996, Pages 69-74

  Herbst, G ^a   Steiner, M ^a   Marowsky, G ^a   Matthias, E ^a  

^a DEUTSCHE TELEKOM LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC GROUNDING; IRRADIATION; LASER ABLATION; LASER PULSES; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

FEMTOSECOND LASER PULSES; NONTHERMAL MATERIAL REMOVAL;

SEMICONDUCTOR MATERIALS;

EID: 0029770784     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)