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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 4 A, 2004, Pages

Boron doping for p-type β-FeSi2 films by sputtering method

(12) Liu, Zhengxin a Osamura, Masato a Ootsuka, Teruhisa a Wang, Shinan b Kuroda, Ryo b,c Fukuzawa, Yasuhiro b Suzuki, Yasuhito a Mise, Takahiro a Otogawa, Naotaka b Nakayama, Yasuhiko b Tanoue, Hisao b Makita, Yunosuke b

a System Engineers' Co Ltd (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

c NIPPON INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Boron; Dopant; Doping; p type; Silicide; Sputtering; FeSi2

Indexed keywords

BORON; CARRIER CONCENTRATION; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); EPITAXIAL GROWTH; GRAIN BOUNDARIES; LIGHT EMITTING DIODES; MULTILAYERS; OPTICAL SENSORS; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

DOPANT; DOPING; HOLE CONCENTRATION; N-TYPE CONDUCTIVITIES; P-TYPE; SILICIDE; Β-FESI2;

IRON COMPOUNDS;

EID: 2942596356 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.43.l504 Document Type: Article

Times cited : (14)

References (12)

1
- 0030616229
- D. Leong, M. Harry, K. J. Reeson and K. P. Homewood: Nature 387 (1997) 686.
- (1997) Nature , vol.387 , pp. 686
- Leong, D.¹ Harry, M.² Reeson, K.J.³ Homewood, K.P.⁴

2
- 0010353362
- K. Lefki and P. Muret: J. Appl. Phys. 74 (1993) 1138.
- (1993) J. Appl. Phys. , vol.74 , pp. 1138
- Lefki, K.¹ Muret, P.²

3
- 0036869193
- S. Chu, T. Hirohada, K. Nakajima, H. Kan and T. Hiruma: Jpn. J. Appl. Phys. 41 (2002) L1200.
- (2002) Jpn. J. Appl. Phys. , vol.41
- Chu, S.¹ Hirohada, T.² Nakajima, K.³ Kan, H.⁴ Hiruma, T.⁵

4
- 0041932366
- C. Li, T. Ohtsuka, Y. Ozawa, T. Suemasu and F. Hasegawa: J. Appl. Phys. 94 (2003) 1518.
- (2003) J. Appl. Phys. , vol.94 , pp. 1518
- Li, C.¹ Ohtsuka, T.² Ozawa, Y.³ Suemasu, T.⁴ Hasegawa, F.⁵

5
- 0035155566
- H. Katsumata, Y. Makita, T. Takada, H. Tanoue, N. Kobayashi, M. Hasegawa, H. Kakemoto, T. Tsukamoto and S. Uekusa: Thin Solid Films 381 (2001) 244.
- (2001) Thin Solid Films , vol.381 , pp. 244
- Katsumata, H.¹ Makita, Y.² Takada, T.³ Tanoue, H.⁴ Kobayashi, N.⁵ Hasegawa, M.⁶ Kakemoto, H.⁷ Tsukamoto, T.⁸ Uekusa, S.⁹

6
- 0347669746
- E. Arushanov, Y. Tomm, L. Ivanenko and H. Lange: Phys. Status Solidi B 210 (1998) 187.
- (1998) Phys. Status Solidi B , vol.210 , pp. 187
- Arushanov, E.¹ Tomm, Y.² Ivanenko, L.³ Lange, H.⁴

7
- 0001129646
- J. Tani and H. Kido: J. Appl. Phys. 86 (1999) 464.
- (1999) J. Appl. Phys. , vol.86 , pp. 464
- Tani, J.¹ Kido, H.²

8
- 0005909273
- S. Teichert, R. Kilper, T. Franke, J. Erben, P. Häussier, W. Henrion, H. Lange and D. Panknin: Appl. Surf. Sci. 91 (1995) 56.
- (1995) Appl. Surf. Sci. , vol.91 , pp. 56
- Teichert, S.¹ Kilper, R.² Franke, T.³ Erben, J.⁴ Häussier, P.⁵ Henrion, W.⁶ Lange, H.⁷ Panknin, D.⁸

9
- 0000751853
- J. Tani and H. Kido: J. Appl. Phys. 84 (1998) 1408.
- (1998) J. Appl. Phys. , vol.84 , pp. 1408
- Tani, J.¹ Kido, H.²

10
- 0026256386
- M. Kobayashi and S. Ido: Jpn. J. Appl. Phys. 30 (1991) 2883.
- (1991) Jpn. J. Appl. Phys. , vol.30 , pp. 2883
- Kobayashi, M.¹ Ido, S.²

11
- 2942542458
- to be published
- Z. X. Liu, R. Kuroda, S. N. Wang, Y. Fukuzawa, Y. Suzuki, M. Osamura, N. Otogawa, T. Ootsuka, T. Mise, Y. Nakayama, Y. Hoshino, H. Tanoue and Y. Makita: to be published in J. Appl. Phys. (2004).
- (2004) J. Appl. Phys.
- Liu, Z.X.¹ Kuroda, R.² Wang, S.N.³ Fukuzawa, Y.⁴ Suzuki, Y.⁵ Osamura, M.⁶ Otogawa, N.⁷ Ootsuka, T.⁸ Mise, T.⁹ Nakayama, Y.¹⁰ Hoshino, Y.¹¹ Tanoue, H.¹² Makita, Y.¹³

12
- 0027906663
- U. Erlesand and M. Östling: Appl. Surf. Sci. 73 (1993) 186.
- (1993) Appl. Surf. Sci. , vol.73 , pp. 186
- Erlesand, U.¹ Östling, M.²

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