NEXAFS spectra of an epitaxial boron nitride film on Ni(1 1 1)

Journal of Electron Spectroscopy and Related Phenomena

Volumn 137-140, Issue SPEC. ISS., 2004, Pages 573-578

  Shimoyama, I ^a   Baba, Y ^a   Sekiguchi, T ^a   Nath, K G ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Borazine; Boron nitride (BN); Chemical vapor deposition (CVD); Near edge X ray absorption fine structure (NEXAFS); Polarization dependence; X ray photoelectron spectroscopy (XPS)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRONIC STRUCTURE; MICROELECTRONICS; POLARIZATION; THICKNESS MEASUREMENT; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BORAZINE; BORON NITRIDE; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE (NEXAFS); POLARIZATION DEPENDENCE;

BORON COMPOUNDS;

EID: 2942585106     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2004.02.040     Document Type: Conference Paper

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