Etching properties of ZnS thin films in Cl2/CF4/Ar plasma

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 131-136

  Kim, Dong Pyo ^a   Kim, Chang Il ^a   Kwon, Kwang Ho ^b  

^a Chung Ang University   (South Korea)

^b Hanseo University   (South Korea)

Author keywords

Cl2 CF4 Ar; Optical emission spectroscopy (OES); X ray photoelectron spectroscopy (XPS); ZnS

Indexed keywords

ARGON; CHLORINE; DOPING (ADDITIVES); ELECTROLUMINESCENCE; ELECTRON CYCLOTRON RESONANCE; FLUOROCARBONS; REACTIVE ION ETCHING; SURFACES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC SULFIDE;

CL2/CF4/AR; HYDROCARBON POLYMERS; OPTICAL EMISSION SPECTROSCOPY (OES); VOLUME DENSITIES;

INDUCTIVELY COUPLED PLASMA;

EID: 2942557007     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.128     Document Type: Conference Paper

References (18)

1. King C. J. Vac. Sci. Technol. A. 14:1996;1729.
2. Mach S., Mueller G.O. Semicond. Sci. Technol. 6:1991;305.
3. Rack P.D., Naman A., Holloway P.H., Sun S.-S., Tuenge R.T. MRS Bull. 21:1996;49.
4. Krasnov A.N., Hofstra P.G., McCullough M.T. J. Vac. Sci. Technol. A. 18:2000;671.
5. Ohmi K., Fujimoto K., Tanaka S., Kobayashi H. J. Appl. Phys. 78:1995;428.
6. Sebastian J.S., Swart H.C., Trottier T.A., Jones S.L., Holloway P.H. J. Vac. Sci. Technol. A. 15:1997;2349.
7. Glennis G.J., Orloff J. J. Vac. Sci. Technol. A. 10:1992;3065.
8. Glennis J., Orloff G.J., Elkind J.L., Koch D. J. Vac. Sci. Technol. A. 10:1992;1371.
9. Su S.H., Yokoyama M., Su Y.K. Mater. Chem. Phys. 42:1995;217.
10. Su S.H., Yokoyama M., Su Y.K. Mater. Chem. Phys. 50:1997;205.
11. Lee W., Pathangey B., Davidson M.R., Holloway P.H., Lambers E.S., Davydov B., Anderson T.J., Pearton S.J. J. Vac. Sci. Technol. A. 16:1998;2177.
12. Lee W., Pathangey B., Davidson M.R., Holloway P.H., Lambers E.S., Davydov A., Anderson T.J., Pearton S.J. J. Vac. Sci. Technol. A. 16:1998;1944.
13. S.J. Yun, K.H. Kwon, Y.E. Lee, C.I. Kim, S.I. Kim, J. Electrochem. Soc. (2003) submitted.
14. Pan W., Thio C.L., Desu S.B. J. Mater. Res. 13:1998;364.
15. Mansour S.A., Liedl G.L., Vest R.W. J. Am. Ceram. Soc. 78:1991;1617.
16. Lide D.R. Handbook of Chemistry and Physics. 1996;Chemical Rubber, Boca Raton, FL.
17. Jung J.K., Lee W.J. Jpn. J. Appl. Phys. 40:2001;1408.
18. Chastain J., King R.C. Jr. Handbook of X-ray Photoelectron Spectroscopy. 1992;Physical Electronics Inc, Minnesota.