Parameters of vacuum deposition of ZnS:Mn active layer for electroluminescent displays

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 671-675

  Krasnov, Alex N ^a   Hofstra, Peter G ^a   McCullough, Mike T ^a  

^a Luxell Technologies Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTAL STRUCTURE; DEPOSITION; EVAPORATION; LUMINESCENT DEVICES; PHOSPHORS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ZINC COMPOUNDS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ACTIVE LAYER; BRIGHTNESS VOLTAGE CHARACTERISTICS; VACUUM DEPOSITION;

VACUUM APPLICATIONS;

EID: 0034156210     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582246     Document Type: Article

References (18)

1. Y. J. Lin, Y. K. Su, and M. Yokoyama, Appl. Surf. Sci. 65/66, 461 (1993).
2. P. J. Wright, B. Cockayne, A. F. Cattle, P. J. Dean, and A. D. Pitt, J. Cryst. Growth 59, 148 (1982).
3. T. Suntola, J. Antson, A. Pakkala, and S. Lindfors, SID Digest of Technical Papers (1980), p. 108.
4. L. I. Maissel and R. Glang, Handbook of Thin Film Technology (McGraw-Hill, New York, 1970).
5. H. Venghaus, D. Theis, H. Oppolzer, and S. Schild, J. Appl. Phys. 53, 4146 (1982).
6. S. Ohta, T. Tadokoro, S. Satou, S. Kobayashi, and F. Kaneko, J. Lumin. 47, 41 (1990).
7. A. N. Krasnov, Prog. Cryst. Growth Charact. Mater. 37, 123 (1998).
8. N. I. Donkov and D. L. Staikov, in Vac. Electr. and Ion Technol., edited by D. S. Karpuzov (Nova Science, 1996), p. 91.
9. K. Neyts, P. De Visschere, and B. Soenen, 4th International Conference Sci. Tech. Displ. Phosp. 14-17 Sep. 1998, Extended Abstracts, p. 315.
10. R. Menn, R. J. Tueta, A. Izrael, and M. Braguier, IEEE Trans. Electron Devices ED-30, 460 (1983).
11. J. L. Rood, J. Opt. Soc. Am. 41, 201 (1951).
12. T. Nire, A. Matsuno, and A. Miyakoshi, Jpn. J. Appl. Phys., Part 1 33, 2605 (1994).
13. A. N. Krasnov, Thin Solid Films 347, 1 (1999).
14. A. N. Krasnov, R. C. Bajcar, and P. G. Hofstra, J. Vac. Sci. Technol. A 16, 906 (1998).
15. H. Oppolzer, S. Schild, H. Venghaus, and D. Theis, Proceedings of the 10th International Congr. On Electron Microscopy, Hamburg, 1982, Vol. 2, p. 421.
16. A. Fuh, R. P. Gallinger, P. Schuster, J. Adolph, and O. C. Caporaletti, Thin Solid Films 207, 202 (1991).
17. A. N. Krasnov, R. C. Bajcar, and P. G. Hofstra, Appl. Phys Lett. 73, 351 (1998).
18. V. P. Singh, J. G. Rascon, J. C. McClure, F. Pool, and D. C. Morton, SID 96 Digest (1996), p. 371.