Selective deposition of Co thin films for TFT gate electrode by non-optic method; micro-contact printing and MOCVD

Journal of the Korean Physical Society

Volumn 47, Issue SUPPL. 3, 2005, Pages

  Yang, H J ^a   Lee, H M ^a   Kim, J Y ^a   Shin, H J ^a   Lee, J H ^a,b   Lee, J G ^a   Sung, M M ^a   Cho, B S ^b   Jeong, C O ^b   Chung, K H ^b   Lee, C M ^c   Lee, E G ^d   Hong, H N ^e  

^a Kookmin University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Inha University   (South Korea)

^d Chosun University   (South Korea)

^e Agency for Defence Development   (South Korea)

Author keywords

Micro contact printing; SAMs (self assembled monolayers); Selective deposition

Indexed keywords

EID: 29344469877     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (10)

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