Selective chemical vapor deposition of copper on AZ 5214™-patterned silicon substrates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 759-761

  Davazoglou, D ^a   Vidal, S ^b   Gleizes, A ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GRAIN SIZE AND SHAPE; PHOTORESISTS; POLYMERS; SILICON; SUBSTRATES;

SILICON SUBSTRATES;

COPPER;

EID: 0035326282     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1362680     Document Type: Conference Paper

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