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Volumn 52, Issue 12, 2005, Pages 2814-2816

The influence of source and drain junction depth on the short-channel effect in MOSFETs

Author keywords

MOSFET scale length; Short channel effect (SCE); Source and drain junction depth

Indexed keywords

BOUNDARY CONDITIONS; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; EIGENVALUES AND EIGENFUNCTIONS; FINITE ELEMENT METHOD; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICE STRUCTURES;

EID: 29244470866     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.859614     Document Type: Article
Times cited : (22)

References (6)
  • 1
    • 0018545120 scopus 로고
    • "Geometry effects of small MOSFET devices"
    • Nov
    • F. H. Gaensslen, "Geometry effects of small MOSFET devices," IBM J. Res. Dev., vol. 23, no. 6, pp. 682-688, Nov. 1979.
    • (1979) IBM J. Res. Dev. , vol.23 , Issue.6 , pp. 682-688
    • Gaensslen, F.H.1
  • 2
    • 33646900503 scopus 로고    scopus 로고
    • "Device scaling limits of Si MOSFETs and their application dependencies"
    • Mar
    • D. J. Frank, R. H. Dennard, E. Nowak, P. M. Solomon, Y. Taur, and H. P. Wong, "Device scaling limits of Si MOSFETs and their application dependencies," Proc. IEEE, vol. 89, no. 3, pp. 258-288, Mar. 2001.
    • (2001) Proc. IEEE , vol.89 , Issue.3 , pp. 258-288
    • Frank, D.J.1    Dennard, R.H.2    Nowak, E.3    Solomon, P.M.4    Taur, Y.5    Wong, H.P.6
  • 3
    • 0003703001 scopus 로고
    • "Small-geometry MOS transistors: Physics and modeling of surface- and buried-channel MOSFETS"
    • Ph.D. dissertation, Stanford Univ., Stanford, CA
    • T. N. Nguyen, "Small-geometry MOS transistors: Physics and modeling of surface- and buried-channel MOSFETS," Ph.D. dissertation, Stanford Univ., Stanford, CA, 1984.
    • (1984)
    • Nguyen, T.N.1
  • 5
    • 0032187666 scopus 로고    scopus 로고
    • "Generalized scale length for two-dimensional effects in MOSFETs"
    • Oct
    • D. J. Frank, Y. Taur, and H. P. Wong, "Generalized scale length for two-dimensional effects in MOSFETs," IEEE Electron Device Lett., vol. 19, no., pp. 385-387, Oct. 1998.
    • (1998) IEEE Electron Device Lett. , vol.19 , pp. 385-387
    • Frank, D.J.1    Taur, Y.2    Wong, H.P.3
  • 6
    • 0024737720 scopus 로고
    • "MOSFET scaling limits determined by subthreshold conduction"
    • Oct
    • J. M. Pimbley and J. D. Meindl, "MOSFET scaling limits determined by subthreshold conduction," IEEE Trans. Electron Devices, vol. 36, no. 10, pp. 1711-1721, Oct. 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , Issue.10 , pp. 1711-1721
    • Pimbley, J.M.1    Meindl, J.D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.