In situ transmission electron microscopy ion irradiation studies at Orsay

Journal of Materials Research

Volumn 20, Issue 7, 2005, Pages 1758-1768

  Ruault, M O ^a   Fortuna, F ^a   Bernas, H ^a   Chaumont, J ^a   Kaitasov O ^a   Borodin, V A ^b  

^a 91405 Orsay Campus   (France)

^b KURCHATOV INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATOMS; COBALT; COMPUTER SIMULATION; CRYSTAL GROWTH; ION IMPLANTATION; IRRADIATION; NUCLEATION; TRANSMISSION ELECTRON MICROSCOPY;

ION BEAM IRRADIATION; METAL SILICIDE NANOPRECIPITATES; NANOCAVITY EVOLUTION;

ION BEAMS;

EID: 29144514457     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2005.0219     Document Type: Review

References (47)

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