Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5869, Issue , 2005, Pages 1-8

  Shibahara, Masafumi ^a   Yamamura, Kazuya ^b   Sano, Yasuhisa ^b   Sugiyama, Tsuyoshi ^b   Endo, Katsuyoshi ^b   Mori, Yuzo ^b  

^a HYOGO PREFECTURAL INSTITUTE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CRYSTALS; PLASMA APPLICATIONS;

QUARTZ CRYSTALS; RESONANCE CURVES; WAFER SURFACE;

QUARTZ;

EID: 29144455277     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.615604     Document Type: Conference Paper

References (5)

1. Yoshiaki Nagaura and Seiichi Yokomizo, Proc. IEEE Int. Freq. Control Symp., pp. 425-428,1999.
2. Y. Mori, K. Yamauchi, K. Yamamura and Y. Sano, Rev. Sci. Instrum. 71, pp. 4627-4632, 2000.
3. Y. Mori, K. Yamamura and Y. Sano, Rev. Sci. Instrum. 71, pp. 4620-4626, 2000.
4. K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T.Ishikawa, and Y. Mori, Rev. Sci. Instrum. 74, pp. 4549-4553, 2003.
5. Yuzo Mori, Kazuya Yamamura and Yasuhisa Sano, Rev. Sci. Instrum. 75, pp (2004) 942-946.