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Volumn 23, Issue 6, 2005, Pages 2340-2346
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Pattern-dependent microloading and step coverage of silicon nitride thin films deposited in a single-wafer thermal chemical vapor deposition chamber
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Author keywords
[No Author keywords available]
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Indexed keywords
CYCLICAL DEPOSITION;
ETCH STOP FILMS;
MICROLOADING;
SINGLE-WAFER;
AMMONIA;
CHEMICAL VAPOR DEPOSITION;
RANDOM ACCESS STORAGE;
SILANES;
SILICON NITRIDE;
SILICON WAFERS;
THIN FILMS;
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EID: 29044445783
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2102947 Document Type: Article |
Times cited : (8)
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References (24)
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