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Volumn 23, Issue 6, 2005, Pages 2340-2346

Pattern-dependent microloading and step coverage of silicon nitride thin films deposited in a single-wafer thermal chemical vapor deposition chamber

Author keywords

[No Author keywords available]

Indexed keywords

CYCLICAL DEPOSITION; ETCH STOP FILMS; MICROLOADING; SINGLE-WAFER;

EID: 29044445783     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2102947     Document Type: Article
Times cited : (8)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.