Co-gas impact of B 2 H 6 plasma diluted with helium on the plasma doping process in a pulsed glow-discharge system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2272-2277

  Qin, Shu ^a   McTeer, Allen ^a   Hu, Y Jeff ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION FRACTION; BORON DOPING; PULSED GLOW DISCHARGE SYSTEM;

ANNEALING; BORON; COBALT COMPOUNDS; DEPOSITION; HELIUM; PLASMAS; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS;

GLOW DISCHARGES;

EID: 29044439118     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2083929     Document Type: Article

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