Dedicated near-field microscopies for electronic materials and devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5856 PART I, Issue , 2005, Pages 1-13

  Balk, Ludwig Josef ^a   Cramer, Ronald Markus ^b   Heiderhoff, Ralf ^a   Phang, Jacob Ch ^c   Sergeev, Oleg ^a,d   Tiedemann, Anne Katrin ^a,c  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b Altis Semiconductor   (France)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^d BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

Atomic force microscopy; Electronic devices; Functional materials; Near field scanning microscopy; Scanning photon emission microscopy; Thermo mechanical properties

Indexed keywords

ACOUSTIC MICROSCOPES; ACOUSTIC WAVES; ATOMIC FORCE MICROSCOPY; CATHODOLUMINESCENCE; RAYLEIGH FADING; SCANNING; THERMOMECHANICAL TREATMENT; TOPOLOGY;

ELECTRONIC DEVICES; FUNCTIONAL MATERIALS; NEAR-FIELD SCANNING MICROSCOPY; SCANNING PHOTON EMISSION MICROSCOPY; THERMO-MECHANICAL PROPERTIES;

OPTOELECTRONIC DEVICES;

EID: 28844496723     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.621577     Document Type: Conference Paper

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