Demolding of high aspect ratio polymeric micro-patterning

International Journal of Nanoscience

Volumn 4, Issue 4, 2005, Pages 543-549

  Yeo, L P ^a   Lam, Y C ^a,b   Chan Park, Mary B ^a,b,c   Joshi, S C ^b   Hardt, D E ^a,d  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c Nanyang Technological University   (Singapore)

^d Massachusetts Institute of Technology   (United States)

Author keywords

Demolding; Micro patterning; Polymer

Indexed keywords

ASPECT RATIO; FINITE ELEMENT METHOD; FRACTURE; MATHEMATICAL MODELS; RESINS; ULTRAVIOLET RADIATION;

DEMOLDING; MICRO-PATTERNING;

THIN FILMS;

EID: 28844475623     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0219581X05003462     Document Type: Article

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