Uncertainty analysis for phase measurement on PSM with a 193nm common-path shearing interferometer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5858, Issue , 2005, Pages 1-13

  Futterer G ^a   Schwider, J ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Lithography @ 193nm; Phase shift measurement; Uncertainty

Indexed keywords

ABERRATIONS; ALGORITHMS; DEGREES OF FREEDOM (MECHANICS); INTERFEROMETERS; MASKS; PHASE SHIFT; SYSTEMATIC ERRORS; UNCERTAIN SYSTEMS; WAVE PROPAGATION;

LITHOGRAPHY @ 193NM; PHASE SHIFT MEASUREMENT; SHEARING INTERFEROMETER; UNCERTAINTY;

PHASE MEASUREMENT;

EID: 28844475113     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.612749     Document Type: Conference Paper

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