Lateral shearing interferometer for phase shift mask measurement at 193 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 541-551

  Futterer G ^a   Lano, M ^a   Lindlein, N ^a   Schwider, J ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

193 nm lithography; Complex degree of coherence; Phase measurement; Phase shift mask; Shearing interferometer

Indexed keywords

DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; EXCIMER LASERS; INTERFEROMETERS; LASER BEAMS; PHASE SHIFT; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; SHEARING;

PHASE SHIFT MASK;

MASKS;

EID: 0036415955     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474601     Document Type: Conference Paper

References (10)

1. M.D. Levenson, N.S. Visnawathan, and R.A. Simpson. Improving Resolution in Photolithography with a Phase Shifting Mask. IEEE Trans. Electron Devices, ED-29(12): 1828-1836, December 1982.
2. H. Kusune, et al.: "Phase Measurement System with Transmitted UV Light for Phase Mask Inspection", SPIE 2254 (1994).
3. M. Francon and S. Mallik; "Polarization Interferometers" Wiley-Interscience London, New York, 1971.
4. T. Tsuruta; "A New Type of Shearing Interferometer for the Measurement of the Transfer Functions of Microscope Objectives"; Appl. Opt. 2, (1963) p. 371.
5. Malacara, D. (1992). Optical Shop Testing. (2nd ed.). New York: John Wiley & Sons, Inc.
6. J. Schwider, et al., "Digital Wave-Front Measuring Interferometry: Some Systematic Error Sources", Appl. Opt. Vol. 22, p. 3421 (1983).
7. H. Beyer: "Theorie und Praxis der Interferenzmikroskopie", Akademische Verlagsgesellschaft Geest & Portig, Leipzig (1974).
8. P.H. van Cittert, Physica, 1 (1934), 201.
9. F. Zernike, Physica, 5 (1938), 785.
10. M. Born, E. Wolf: "Principles of Optics", Pergamon Press (1991).