Double-layered structure of surface modification of low-k dielectrics induced by he plasma

Materials Research Society Symposium Proceedings

Volumn 863, Issue , 2005, Pages 159-163

  Yanai, Ken Ichi ^a   Hasebe, Tadayoshi ^a   Sumiya, Kouji ^a   Oguni, Seiki ^a   Koga, Kazuhiro ^a  

^a Consortium for Advanced Semiconductor Materials and Related Technologies ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON-DEPLETION SURFACE; DOUBLE-LAYERED STRUCTURE; HYDROFLUORIC ACID (HF);

DIELECTRIC MATERIALS;

EID: 28844457019     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-863-b2.3     Document Type: Conference Paper

References (5)

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5. M. Colburn, S. Nitta, J. Zinter, N. Chakrapani, et al., Proc. AMC 2003, pp. 489-493.