Evaluation of silicon nitride as a diffusion barrier for Gd-Si-Ge films on silicon

Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1335-1340

  Sambandam, Senthil N ^a   Bethala, Bharath ^a   Sood, Dinesh K ^b   Bhansali, Shekhar ^a  

^a University of South Florida   (United States)

^b RMIT UNIVERSITY   (Australia)

Author keywords

Diffusion barrier; Magnetocaloric; Sputtering; Thin films

Indexed keywords

ANNEALING; DIFFUSION COATINGS; GADOLINIUM ALLOYS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIER; MAGNETOCALORIC ALLOY; MAGNETOCALORIC PHASE;

SILICON NITRIDE;

COATING;

EID: 28844447876     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.130     Document Type: Article

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