Application of energy-filtering TEM in contrast enhancement and elemental identification in IC failure analysis

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

Volumn 2003-January, Issue , 2003, Pages 202-205

  Zhang, W ^a   Ng, S ^a   Cheong, D ^a   Lim, S ^a  

^a Syst on Silicon Mfg Co Pte Ltd   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; INTEGRATED CIRCUITS;

CHEMICAL CHARACTERIZATION; CONTRAST ENHANCEMENT; ELEMENTAL IDENTIFICATIONS; ENERGY-FILTERING TEM; IC FAILURE ANALYSIS; TECHNOLOGY NODES;

FAILURE ANALYSIS;

EID: 28744446891     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IPFA.2003.1222766     Document Type: Conference Paper

References (8)

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8. Dai, J.Y.; Loh, K.; Tee, S.F.; Tay, C.L.; Ansari, S.; Er, F.; Redkar, S.; "High resistance via induced by marginal barrier metal step coverage and F diffusion", Proceedings of the 8th International Symposium on the Physical and Failure Analysis of integrated Circuits, 2001 pp: 183-186