Five-nanometer thick silicon on insulator layer

Journal of Applied Physics

Volumn 98, Issue 10, 2005, Pages

  Elmasry, N A ^a   Hunter, M ^a   Elnaggar, A ^a   Bedair, S M ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS OXIDE FILMS; INSULATION LAYER;

EPITAXIAL GROWTH; SINGLE CRYSTALS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 28644449896     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1803625     Document Type: Article

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