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Volumn 477, Issue , 1997, Pages 339-344
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Epitaxial CeO2 on silicon substrates and the potential of Si/CeO2/Si for SOI structures
a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CERIUM COMPOUNDS;
CHEMICAL VAPOR DEPOSITION;
EPITAXIAL GROWTH;
FILM GROWTH;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTING SILICON;
SEMICONDUCTOR GROWTH;
SILICON ON INSULATOR TECHNOLOGY;
SINGLE CRYSTALS;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
CERIA;
SEMICONDUCTING FILMS;
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EID: 0031363451
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-474-339 Document Type: Conference Paper |
Times cited : (4)
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References (5)
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