Top-down structure and device fabrication using in situ nanomachining

Applied Physics Letters

Volumn 87, Issue 23, 2005, Pages 1-3

  Li, Xiaodong ^a   Wang, Xinnan ^a   Xiong, Qihua ^b   Eklund, Peter C ^b  

^a University of South Carolina   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATING DENTS; NANOBELTS; NANOWIRES;

ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; PHOTOLITHOGRAPHY; ZINC SULFIDE;

NANOSTRUCTURED MATERIALS;

EID: 28544444642     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2139991     Document Type: Article

References (16)

1. Q. Xiong, G. Chen, J. D. Acord, X. Liu, J. J. Zengel, H. R. Gutierrez, J. M. Redwing, L. C. Lew Yan Voon, B. Lassen, and P. C. Eklund, Nano Lett. 4, 1663 (2004).
2. Q. Xiong, J. Wang, O. Reese, L. C. Lew Yan Voon, and P. C. Eklund, Nano Lett. 4, 1991 (2004).
3. C. Falcony, M. Garcia, A. Ortiz, and J. C. Alonso, J. Appl. Phys. 72, 1525 (1992).
4. T. V. Prevenslik, J. Lumin. 87-89, 1210 (2000).
5. Y. Jiang, X. M. Meng, J. Liu, Z. Y. Xie, C. S. Lee, and S. T. Lee, Adv. Mater. (Weinheim, Ger.) 15, 323 (2003).
6. Y. C. Zhu, Y. Bando, and D. F. Xue, Appl. Phys. Lett. 82, 1769 (2003).
7. X. Li, X. Wang, Q. Xiong, and P. C. Eklund, Nano Lett. 5, 1982 (2005).
8. X. Li and B. Bhushan, Mater. Charact. 48, 11 (2002).
9. B. Bhushan and X. Li, Int. Mater. Rev. 48, 125 (2003).
10. Powder Diffraction File, Inorganic Volume, Swarthmore, PA.: JCPDS - International Centre for Diffraction Data, 1960-1987.
11. D. L. Feldheim and C. D. Keating, Chem. Soc. Rev. 27, 1 (1998).
12. H. T. Ng, J. Han, T. Yamada, P. Nguyen, Y. P. Chen, and M. Meyyappan, Nano Lett. 4, 1247 (2004).
13. X. Duan, Y. Huang, Y. Cui, and C. M. Lieber, in Molecular Nanoelectronics, edited by, M. A. Reed, and, T. Lee, (American Scientific, Stevenson Ranch, CA, 2003), pp. 199-227.
14. G. Maruccio, R. Cingolani, and R. Rinaldi, J. Mater. Chem. 14, 542 (2004).
15. S. Tan, Z. Tang, X. Liang, and N. A. Kotov, Nano Lett. 4, 1637 (2004).
16. M. W. Dashiell, R. T. Troeger, S. L. Rommel, T. N. Adam, P. R. Berger, C. Guedj, J. Kolodzey, A. C. Seabaugh, and R. Lake, IEEE Trans. Electron Devices, 47, 1707 (2000).