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Volumn 242, Issue 1-2, 2006, Pages 257-260

Dot-array implantation for patterned doping of semiconductors

Author keywords

Focused ion beam (FIB); Gallium; Implantation

Indexed keywords

DOPING (ADDITIVES); ELECTRON BEAMS; GALLIUM; ION BEAMS; ION IMPLANTATION; MOSFET DEVICES; SILICON;

EID: 28544438073     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.08.197     Document Type: Conference Paper
Times cited : (5)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.