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Volumn 242, Issue 1-2, 2006, Pages 257-260
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Dot-array implantation for patterned doping of semiconductors
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Author keywords
Focused ion beam (FIB); Gallium; Implantation
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Indexed keywords
DOPING (ADDITIVES);
ELECTRON BEAMS;
GALLIUM;
ION BEAMS;
ION IMPLANTATION;
MOSFET DEVICES;
SILICON;
DOT-ARRAYS;
EFFECTIVE BEAMS;
FOCUSED ION BEAM (FIB);
IMPLANTATION;
SEMICONDUCTOR MATERIALS;
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EID: 28544438073
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2005.08.197 Document Type: Conference Paper |
Times cited : (5)
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References (14)
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